Non-contact Film Thickness Measurement
IRT-measurement in the range of 20Å ~60,000Å (6 micron )
ALTO-IRT-7000 (Impedance Resonance Technology ) film thickness metrology tool utilizes non-contact capacitive and Eddy Current technology to analyze micro sectors on coated surfaces that are 1000 times smaller than any comparable Eddy Current products. But most importantly, this unique IRT technology allows for sophisticated analyses of the continuous and discrete films below 50 Angstroms, dramatically improving the accuracy of quality control readings.
- >> IRT uses non-contact probing of a sample under test by harmonic electromagnetic fields.
- >> Thin & thick conductive film measurement in the range of 20Å – 60,000Å (6 μm )
- >> Bulk resistivity: 10μΩ*cm – 10 KΩ*cm, Sheet resistance: 10μΩ/□ – 10 KΩ /□
- >> Blanket and pattern wafer mapping
Measurement of Cap Layer
Metal above Metal thickness measurement
IRT uses a proprietary data processing algorithm that delivers non-contact real time measuring results with superior sensitivity and accuracy at speeds of 10 to 500 measurements per second.
Two step measurement of cap layer (CoWP) 50Å above 1,000Å Cu film. First row of pictures shows Cu film only. Second row shows pictures after deposition of the cap layer. Bottom pictures were obtained by subtracting “Cu layer” from “Cu + cap layers”. That gave us resulting thickness and pictures. It also shows that deposition was not uniform and needed improvement.
Thin Film
Si wafer with Cu film ~100Ǻ
Metal film resistivity or film thickness is measured from the back side of a wafer. Chuck with array (49 illustreated) of IRT sensors are used for simultaneous and instantaneous measurement of metal film resistivity, or wafer bulk resistivity.
- Measurement time<1 sec
- Repeatability <0.5%
- Accuracy ±10 Å
Questions?
write to us if you have any questions or you would like to request technical details or arrange a demo.
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